Andrew V. Teplyakov, Ph. D.
Professor, University of Delaware,
Newark, DE 19711 Department of Chemistry and Biochemistry,
112 Lammot DuPont Laboratory,
Tel: (302) 831-1969
Fax: (302) 831-6335
e-mail: andrewt@udel.edu
http://www.udel.edu/chem/teplyakov/teplyakov.htm
_____________________________________________________________________________
PERSONAL:
Date of Birth: January 23, 1970
Place of Birth: Moscow, Russia
PRIMARY RESEARCH INTERESTS: Molecular and microelectronics, semiconductor nanostructures and thin films, materials and structures for sustainable energy, electronic properties of covalently bound chemical and biological systems on semiconductor substrates, atomically-precise manufacturing (ALD and ALE) experimental and computational studies of surface chemical reactivity.
EDUCATION:
Doctor of Philosophy in Physical Chemistry 1997
Columbia University, New York, NY.
Thesis Advisor: Professor Brian E. Bent
Thesis Title: “Bonding and reactions of hydrocarbons and their fragments on single crystal surfaces of copper and copper-platinum alloy: identification of surface intermediates and reaction mechanisms”
Master of Philosophy in Chemistry 1996
Columbia University, New York, NY.
Master of Arts in Chemistry 1994
Columbia University, New York, NY.
Bachelor of Science in Chemistry 1992
Moscow State University, Moscow, Russia.
RESEARCH EXPERIENCE:
2008-Present. Professor at the University of Delaware
2004-2008. Associate professor at the University of Delaware.
1998-2004. Assistant professor at the University of Delaware.
1996-1998 Postdoctoral research with Prof. Stacey Bent (New York University, now at Stanford University). This research was related to chemical properties of semiconductor surfaces.
1992-1996 Doctoral research with Prof. Brian Bent (then at Columbia University; deceased). This research was focused on the reactions of hydrocarbons and halohydrocarbons on single crystal surfaces.
1990-1992 Undergraduate research with Prof. Igor Beckman (Moscow State University, Division of Chemical Engineering and A. V. Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, Moscow, Russia). This research was related to integrated polymeric membrane-moving liquid modules for gas separation and purification.
1988-1990 Undergraduate research with Prof. Eduard Filatov (Moscow State University, Division of Radiochemistry). The research involved applied radiochemistry and radiotracer techniques for studies of the reactions of hot tritium atoms with solid organic substrates.
TEACHING EXPERIENCE:
Spring 1991: Teaching Assistant Radiochemistry and Chemical Technology (Moscow State University);
Fall 1992: Teaching Assistant Organic Chemistry (Columbia University);
Spring 1993: Teaching Assistant Organic Chemistry (Columbia University);
Fall 1993: Teaching Assistant Organic Chemistry (Columbia University);
1998-present: Physical Chemistry for Majors (CHEM-443 and CHEM-444, University of Delaware);
2000-present: Structure and Properties of Surfaces (CHEM-678 (earlier CHEM-874), University of Delaware);
2010-present: Introductory Physical Chemistry (CHEM-418 and CHEM 419, University of Delaware).
2020-present: Chemical Dynamics (CHEM-674)
PROFESSIONAL MEMBERSHIPS:
Mendeleev Chemical Society (Russia)
American Chemical Society (USA)
American Vacuum Society (USA)
Sigma Xi (USA)
Center for Catalytic Science and Technology at the University of Delaware (1998-present)
AWARDS:
Fellow of the American Vacuum Society 2021
University of Delaware Outstanding Doctoral Graduate Advising and Mentoring Award, 2016.
Invited LaMattina Lectureship at the Department of Chemistry, University of New Hampshire (Durham, NH), 2014
American Chemical Society Delaware Section Award, 2012.
Top Cited Author Surface Science Reports award based on Scopus citations from 2005-2009. (Leftwich, T. R. and Teplyakov, A. V. Chemical Manipulation of Multifunctional Hydrocarbons on Silicon Surfaces. Invited Review.Surf. Sci. Rep.2008, 63, 1-71).
Columbia University Pegram Award for the meritorious achievement by graduate students in their progress toward the Ph. D., 1996
Diploma with excellence of Moscow State University, 1992.
Best undergraduate project in physical chemistry. Moscow State University, 1992.
FIELD RESEARCH:
1. Summer 1989: Pollution in Far East (joint project of Institute of Oceanography and Moscow State University, Russia);
2. Summer 1991: Pollution of Black Sea (Moscow – Istanbul; Moscow State University).
SERVICE TO THE GREATER SCIENTIFIC COMMUNITY:
Associate Editor (2014-present): Applied Surface Science
Editorial Advisory Board Member (2016-present): Surface Science, Langmuir, Frontiers in Materials
Subject Editor: Encyclopedia of Interfacial Chemistry: Surface Science and Electrochemistry,Major Reference Work, Editor-in-Chief: Professor Klaus Wandelt.
Guest Editor: Applied Surface Science, Special Issue: Special Topics on Surfaces and Interfaces for Renewable Energy (co-edited with R. L. Opila, J. Whitten, and P. Sheldon), 2014, v. 323.
Alternate Councilor (2016-present): American Chemical Society, Division of Colloid and Surface Science.
Executive Board member (2016-2018):American Vacuum Society, Surface Science Division.
Professional Meetings and Symposia Organized:
- Symposium “Chemistry of Carbonaceous Materials” at the National Meeting of the American Chemical Society (New Orleans, LA 2003)
- Symposium “Chemistry of Carbonaceous Materials” at the National Meeting of the American Chemical Society (San Diego, CA 2005, in series with New Orleans, LA 2003)
- Surface Science Sectionat the Eastern Analytical Symposium 2008, 2010, 2011, 2014
- Surface Science Section (five sessions) at the 86thACS Colloid and Surface Science Symposium, Johns Hopkins University (Baltimore, MD, June 10-14th, 2012, co-organizer with Prof. H. Fairbrother).
- Symposium “Molecular Processes at Solid Surfaces” at the National Meeting of the American Chemical Society (Philadelphia, PA 2012).
- Symposium in honor of Stacey Bent (for ACS Award in Surface Chemistry) at the National Meeting of the American Chemical Society (New Orleans, LA), March 18-22, 2018.
- Telluride Science Research Center workshop “Semiconductor Surface Chemistry”, 2010, 2014, 2018, 2022.
- Symposium “Semiconductor Surfaces: From Chemistry & Function to Applications” at the National meeting of the American Chemical Society (Philadelphia, PA, 2020).
- Symposium “Semiconductor Surfaces: From Chemistry & Function to Applications” at the National meeting of the American Chemical Society (San Antonio, TX, 2021).
- Symposium “Spectroscopy: From Molecules to Microstructures” at the MARM 2021, Newark, DE.
- Technical symposium on “Surface Chemistry” for the ACS Colloid and Surface Chemistry Division (COLL) for the Spring 2022 National Meeting in San Diego, CA (March 20-24).
Other professional activities:
Panel Reviewer: NSF Review Panel on Course, Curriculum, Laboratory Improvement Program, member, NSF STTR, NSF GRFP, NSF MSN, NSF CSDM-A.
Participant in the Department of Energy Workshop, 2002.
Transportation Chair, Executive Board of Eastern Analytical Symposium 2010.
Award Committee vice-Chair, Executive Board of Eastern Analytical Symposium 2011.
Award Committee Chair, Executive Board of Eastern Analytical Symposium 2012.
Program Committee vice-Chair, Executive Board of Eastern Analytical Symposium 2013.
Program Committee Chair, Executive Board of Eastern Analytical Symposium 2014.
Panel Reviewer: Canada Foundation for Innovation, 2014.
Organizer of the Telluride Workshop on Semiconductor Surface Chemistry 2006, 2010, 2014, 2018, 2022.
General User, National Synchrotron Light Source, Brookhaven National Laboratory (1993-present)
Chair of Physical Chemistry sessions on multiple National Meetings of the American Chemical Society.
Chair of Surface Science sessions on multiple National Meetings of the American Vacuum Society.
Chair of Surface Science sessions at Eastern Analytical Symposium 2008, 2009, 2010, 2011, 2013, 2014, 2017.
Over 130 presentations were given since 1993, 125 of them invited (including presentations at the National Meetings of the American Chemical Society, American Vacuum Society, Eastern Analytical Symposium, Gordon Research Conference).
Over 100 other presentations co-authored by Dr. Andrew V. Teplyakov were delivered by students and postdoctoral fellows in his group and in research groups involved in collaborative investigations. These oral and poster presentations were given on national meetings of the American Chemical Society and the American Vacuum Society, Middle Atlantic Regional Meetings of the American Chemical Society, Eastern Analytical Symposia, Annual Reviews of the Center for Catalytic Science and Technology at the University of Delaware.
INVITED PRESENTATIONS:
- State University of New York at Albany (Albany, NY) 1997.
- University of Delaware (Newark, DE) 1998.
- DuPont Central Research and Development (Wilmington, DE) 1999.
- Center for Catalytic Science and Technology at the University of Delaware (Newark, DE) 1999.
- Rutgers, The State University of New Jersey (New Brunswick, NJ) 2000.
- City College of the City University of New York (New York, NY) 2000.
- DuPont Central Research and Development (Wilmington, DE) 2000.
- Center for Catalytic Science and Technology at the University of Delaware (Newark, DE) 2000.
- University of California, Riverside (Riverside, CA) 2001.
- University of California, Davis (Davis, CA) 2001.
- University of Southern California, (Los Angeles, CA) 2001.
- Stanford University (Palo Alto, CA) 2001.
- Temple University (Philadelphia, PA) 2001.
- University of Pittsburgh (Pittsburgh, PA) 2002.
- Carnegie Mellon University (Pittsburgh, PA) 2002.
- Johns Hopkins University (Baltimore, MD) 2002.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2002.
- Princeton University (Princeton, NJ) 2003.
- Brigham Young University (Provo, UT) 2003.
- University of Reno, Nevada (Reno, NV) 2003.
- University of California, San Diego (La Jolla, CA) 2003.
- 226thNational Meeting of the American Chemical Society (New York, NY) 2003.
- 227thNational Meeting of the American Chemical Society (Anaheim, CA) 2004.
- Lyondell Chemical Company (PA) 2004.
- University of South Carolina (Columbia, SC) 2004.
- University of North Carolina (Charlotte, NC) 2004.
- Center for Catalytic Science and Technology, University of Delaware (Newark, DE) 2005.
- Pontifical Catholic University of Peru (PCUP, Lima, Peru) 2005.
- George Washington University (Washington, DC) 2005.
- Columbia University (New York, NY) 2005 (extended group meeting in the group of Professor George W. Flynn).
- 229thNational Meeting of the American Chemical Society (San Diego, CA) 2005.
- University of Missouri-Columbia (Columbia, MO) 2005.
- Oklahoma State University-Stillwater (Stillwater, OK) 2005.
- Washington State University (Pullman, WA) 2006.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2006.
- Hunter College (New York, NY) 2006.
- Gordon Research Conference on Chemical Reactions at Surfaces (Ventura, CA) 2007.
- Lehigh University (Bethlehem, PA) 2007.
- University of Delaware, Teachers Conference (Newark, DE) 2007.
- Eastern Analytical Symposium (Somerset, NJ) 2007.
- 233rdNational Meeting of the American Chemical Society (Chicago, IL) 2007.
- Moscow State University (Moscow, Russia) 2007.
- University of Pittsburgh (Pittsburgh, PA) 2007.
- Temple University (Philadelphia, PA) 2008. The visit combined the research presentation and discussion and the meeting with the ACS-student affiliates (Temple University Chemical Society).
- Columbia University (New York, NY), April 2008.
- Lanzhow Institute of Chemical Physics, Chinese Academy of Sciences (Lanzhow, China), June 2008.
- College of Chemistry and Chemical Engineering, Lanzhou University (Lanzhow, China), June 2008.
- Yuzhong Campus of Lanzhou University, Presentation to the undergraduate students (Lanzhow, China), June 2008.
- Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences (Beijing, China), June 2008.
- Iberoamerican Congress of Chemistry and XXIV Congress of the Peruvian Chemical Society (Congreso Oberoamericano De Química, XXIV Congreso Peruano de Química) (Cuzco, Peru), October 2008.
- Tufts University (Boston, MA) 2009.
- Smith College (Northampton, MA) 2009.
- North Carolina State University, Department of Chemical Engineering (Raleigh, NC) 2009.
- University of Kentucky (Lexington, KY) 2009.
- The 56th International Symposium and Exhibition of the American Vacuum Society (San Jose, CA) 2009.
- Eastern Analytical Symposium (Somerset, NJ), 2009.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2010.
- Eastern Analytical Symposium (Somerset, NJ), 2010.
- Drexel University (Philadelphia, PA), 2011.
- University of Texas at Austin, Department of Chemical Engineering (Austin, TX) 2011.
- University of Texas at Dallas, Department of Materials Science and Engineering (Dallas, TX) 2011.
- Texas A&M University (College Station, TX) 2011.
- Moscow State University of Fine Chemical Technology (Moscow, Russia) 2011.
- Schlumberger Technology Corporation (Sugarland, TX) 2012.
- University of Texas at San Antonio (Department of Physics and Astronomy) 2012.
- 243rdNational Meeting of the American Chemical Society, Division of Energy and Fuels, (San Diego, CA) 2012.
- 243rdNational Meeting of the American Chemical Society, Division of Colloid and Surface Chemistry, (San Diego, CA) 2012.
- DuPont Eastern European Network-Russia, DuPont Central Research and Development (Wilmington, DE) 2012.
- 244thNational Meeting of the American Chemical Society, Award Symposium in Honor of Dr. Anne M. Gaffney for the Award in Industrial Chemistry, (San Diego, CA) 2012.
- Workshop at the University College, London (UCL) Theory Meets Experiment: Organic Molecules on Inorganic Substrates (London, UK), June 24th, 2013.
- University College, London (UCL) Department of Electronic and Electrical Engineering (London, UK) 2013.
- University of Crete (Department of Materials Science and Technology), (Crete, Greece), 2013.
- Institute of Chemistry and Biochemistry – Physical and Theoretical Chemistry, Freie Universität Berlin (Berlin, Germany) 2013.
- Middle Tennessee State University, Department of Chemistry (Murfreesboro, TN) 2013.
- Georgia Institute of Technology, School of Chemical & Biomolecular Engineering (Atlanta, GA) 2013.
- University of South Carolina, Department of Chemistry and Biochemistry (Columbia, SC) 2013.
- Center for Catalytic Science and Technology at the University of Delaware (Newark, DE) 2013.
- Rutgers, the State University of New Jersey, Laboratory of Surface Modification (LSM) seminar series (New Brunswick, NJ), 2014.
- 246thNational Meeting of the American Chemical Society (Dallas, TX), 2014.
- Invited LaMattina Lectureship at the Department of Chemistry, University of New Hempshire (Durham, NH), 2014.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2014.
- Queens University – Belfast, School of Chemistry and Chemical Engineering (Belfast, Northern Ireland), 2015.
- The University of Nottingham (Nottingham, UK), 2015.
- Workshop at the University College, London (UCL) Theory meets experiment: molecular nanoscience and applications (London, UK), June 1-3, 2015.
- 1st International Conference on Applied Surface Science (ICASS), 27-30 July 2015, Riverside Oriental Hotel, Shanghai, China (invitation as a part of editorial staff of Elsevier).
- Sorbonne Universités, Université Pierre et Marie Curie, Paris 06 (Paris, France), 2015.
- Universite Paul Sabatier, Groupe NanoSciences (Toulouse, France) 2015.
- Workshop “Green Chemistry in Mineral Processing”, Cumbre Internacional de Ingenería, SUMA 2015, October 15th, University of Technology and Engineering, UTEC (Lima, Peru) 2015.
- Department of Chemical Engineering, University of Technology and Engineering, UTEC (Lima, Peru) 2015.
- Graduate Student Recruiting Seminar, University of Technology and Engineering, UTEC (Lima, Peru) 2015.
- Yeungnam University, Yeungnam University – University of Delaware Joined Workshop (Gyeongbuk, Korea) 2015
- Thermal Analysis Forum of the Delaware Valley (TAFDV), Temple University, Philadelphia, PA, April 13, 2016
- 252ndNational Meeting of the American Chemical Society (Philadelphia, PA), 2016.
- Wageningen University (Wageningen, The Netherlands), 2016.
- Department of Chemistry, Columbia University, Brian E. Bent Memorial Lecture (New York, NY) 2016.
- State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics (Dalian, China), 2017.
- 2ndInter4national Conference on Applied Surface science, 12-15 June, 2017 (Dalian, China), 2017.
- Dalian University of Technology, School of Chemical Engineering (Dalian, China), 2017.
- National Taipei University of Technology, Department of Molecular Science and Engineering (Taipei, Taiwan), 2017.
- Department of Chemistry, Rutgers – Newark (Newark, NJ) 2017.
- University of Technology and Engineering, UTEC (Lima, Peru) 2017.
- Graduate Student Recruiting Seminar, University of Technology and Engineering, UTEC (Lima, Peru) 2017.
- International conference on “Lixiviación de minerales refractarios conteniendo metales nobles: investigaciones del nivel atómico al nivel piloto”, Jueves Minero, Instituto de Ingenieros de Minas del Perú (IIMP) (Lima, Peru), October 26, 2017.
- 255thNational Meeting of the American Chemical Society (New Orleans, LA), 2018.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2018.
- Earth Science and Engineering, Royal School of Mines, Imperial College London (London, UK), 2018.
- London Centre for Nanotechnology, University College, London (UCL) (London, UK), 2018.
- Department of Chemistry and Biochemistry, California State University, Long Beach, (Long Beach, CA), 2018.
- Department of Chemistry, University of California, Riverside (Riverside, CA), 2018.
- Chemistry Department, University of Massachusetts, Lowell (Lowell, MA), 2018.
- Department of Chemistry, Purdue University (West Lafayette, IN), 2019.
- Department of Chemistry, Indiana University (Bloomington, IN), 2019.
- The 66th International Symposium and Exhibition of the American Vacuum Society (Columbus, OH), 2019.
- National Meeting of the American Chemical Society (Philadelphia, PA), 2020, Virtual Meeting.
- 20th International Conference on Atomic Layer Deposition Featuring 7th International Atomic Layer Etching Workshop, June29 – July 1, 2020 (Ghent, Belgium, Virtual Meeting)
- The Chemours Company, Newark, DE, 2021.
- Air Liquide, Newark, DE, 2021.
- Lam Research Corporation (Virtual), Fremont, CA, 2021.
- New Jersey Institute of Technology, Department of Chemistry and Envirotnmental Science, Newark, NJ, 2021.
- West Chester University, West Chester, PA, 2022.
- Telluride Workshop on Semiconductor Surface Chemistry (Telluride, CO) 2022.
- University of Rochester, Department of Chemical Engineering, Rochester, NY, 2022.
- 242nd Electrochemical Society Meeting, October 9-13, Atlanta, GA, 2022.
- 2023 Materials Research Society Meeting, San Francisco, CA, planned for 2023.
- 2023 Spring Meeting of the German Physical Society (Deutsche Physikalische Gesellschaft, DPG), Dresden, Germany, planned for March 26-March 31st.
PUBLICATIONS:
Invited Reviews, Concepts, Books
12. Dybowski, C. and Teplyakov, A. Essential Data and Equations for a Course in Physical Chemistry, 3rd Edition, D & T Publishing, 2021, ISBN-13 978-0-578-90215-9
11. Williams, M. G. and Teplyakov, A. V. Chemical Functionalization of Surfaces: Preparation for Secondary Chemical Modification. Chapter in “Encyclopedia of Interfacial Chemistry – Surface Science and Electrochemistry”, 2017, Elsevier, Inc., DOI: 10.1016/B978-0-12-409547-2.13559-0
10. Gao, F. and Teplyakov, A. V. Challenges and Opportunities in Chemical Functionalization of Semiconductor Surfaces. Invited Concept Article, Appl. Surf. Sci. 2017, 399, 375-386, DOI: 10.1016/j.apsusc.2016.12.083. This paper is highlighted on Elsevier Physics Twitter Channel: Elsevier Physics @ElsevierPhysics; Challenges & Opportunities in #ChemicalFunctionalization of #Semiconductor Surfaces.
9. Teplyakov, A. V. Adsorption on Semiconductor Surfaces. Chapter in “Surface and Interface Science. Volume 6: Solid-Gas Interfaces II”. Edited book, ed.: Klaus Wandelt, 2015, John Wiley & Sons, Inc.
8. Bent, S. F. and Teplyakov, A. V. Semiconductor Surface Functionalization for Advances in Electronics, Energy Conversion, and Dynamic Systems. J. Vac. Sci Technol. A, 2013, 31(5), 050810-1-12, DOI: 10.1116/1.4810784. Invited Review Article for the Special AVS 60th Anniversary Issue, awarded top 20 most downloaded articles in JVST.
7. Tian, F. and Teplyakov, A. V. Silicon Surface Functionalization Targeting Si-N Linkages. Langmuir 2013, 29(1), 13-28, DOI: 10.1021/la303505s. Invited Feature Article, Image featured on the cover of the journal.
6. Teplyakov, A. V. Influence of Functional Groups in Substituted Aromatic Molecules on the Selection of Reaction Channel, Chapter 6. In “Functionalization of Semiconductor Surfaces.” Edited book, editors: Dr. Feng Tao and Prof. Steven L. Bernasek, 2012, John Wiley & Sons, Inc., Hoboken, NJ, ISBN: 978-0-470-56294-9.
5. Dybowski, C. and Teplyakov, A. Essential Data and Equations for a Course in Physical Chemistry, 2nd Edition, D & T Publishing, 2011, ISBN: 978-0-615-48597-3.
4. Perrine, K. A. and Teplyakov, A. V. Reactivity of Selectively Terminated Single Crystal Silicon Surfaces. Invited Review. Chem. Soc. Rev. 2010, 39, 3256 – 3274.
3. Dybowski, C. and Teplyakov, A. Essential Data and Equations for a Course in Physical Chemistry, Pearson Publishing, 2009, ISBN-13: 978-0-558-30403-4; ISBN-10: 0-558-30403-6.
2. Leftwich, T. R. and Teplyakov, A. V. Chemical Manipulation of Multifunctional Hydrocarbons on Silicon Surfaces. Invited Review. Surf. Sci. Rep. 2008, 63, 1-71. This review article received Top Cited Author Surface Science Reports Award based on Scopus citations from 2005-2009.
1. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Chemistry of Organometallic Compounds on Silicon: The First Step in Film Growth. Invited Concept Paper. Chemistry-A European Journal 2007, 13, 9164-9176.
List of Publications:
143. Parke, T., Silva-Quinones, D., Wang, G. T., and Teplyakov, A. V. The Effect of Surface Terminations on the Initial Stages of TiO2 Deposition on Functionalized Silicon. ChemPhysChem 2023, e202200724, DOI: 10.1002/cphc.202200724.
142. Byron, C., Silva-Quinones, D, Sarkar, S., Brown, S., Bai, S., Quinn, C. M., Grzenda, Z., Chinn, M., and Teplyakov, A. V. Attachment Chemistry of 4-Fluorophenyl Boronic Acid on TiO2 and Al2O3 Nanoparticles. Chem. Mater. 2022, 34, 10659-10669, DOI: 10.1021/acs.chemmater.2c02789.
141. Konh, M., Wang, Y., Pina, M., Xiao, J. Q., and Teplyakov, A. V. Effects of Atomic Layer Etching on Magnetic Properties of CoFeB Films: Reduction of Gilbert Damping. J. Magn. Magn. Mater. 2022, 564(2), 170052, DOI: 10.1016/j.jmmm.2022.170052.
140. Schofiled, S. R., Teplyakov, A. V., Raman, T. S. Atomic and Molecular Functionalisation of Technological Materials: An Introduction to Nanoscale Processes on Semiconductor Surfaces. J. Phys.: Condens. Matter 2022, 34, 210401, DOI: 10.1088/1361-648X/ac5a24.
139. Konh, M., Wang, Y., Chen, H., Bhatt, S., Xiao, J. Q., and Teplyakov, A. V. Selectivity in Atomically Precise Etching: Thermal Atomic Layer Etching of a CoFeB Alloy and its Protection by MgO. Appl. Surf. Sci. 2022, 575, 151751, DOI: 10.1016/j.apsusc.2021.151751.
138. Ferrandon, M. S., Byron, C., Çelik, G., Zhang, Y., Ni, C., Sloppy, J., McCormick, R. A., Booksh, K., Teplyakov, A. V., and Delferro, M. Grafted Nickel-Promoter Catalysts for Dry Reforming of Methane identified through High-Throughput Experimentation. Appl. Catal. A: General, 2022, 629, 118379, DOI: 10.1016/j.apcata.2021.118379.
137. Silva-Quinones, D., Butera, R. E., Wang, G. T., and Teplyakov, A. V. Solution Chemistry to Control Boron-Containing Monolayers on Silicon: Reactions of Boric Acid and 4-Fluorophenylboronic Acid with H- and Cl-terminated Si(100). Langmuir 2021, 37, 7194-7202, DOI: 10.1021/acs.langmuir.1c00763.
136. Lalaguna, L. P., Hedgeland, H., Ryan, P. T. P., Warschkow, O., Muntwiler, M. K., Teplyakov, A. V., Schofield, S. R., and Duncan, D. A. Determination of the Preferred Reaction Pathway of Acetophenone on Si(001) Using Photoelectron Diffraction. J. Phys. Condens. Matter 2021, 33, 214002, DOI: 10.1088/1361-648X/abe6dd.
135. Konh, M., Janotti, A., and Teplyakov, A. V. Molecular Mechanism of Thermal Dry Etching of Iron in a Two-Step Atomic Layer Etching Process: Chlorination Followed by Exposure to Acetylacetone. J. Phys. Chem. C 2021, 125(13), 7142-7154, DOI: 10.1021/acs.jpcc.0c10556.
134. Cañón, J. and Teplyakov, A. V. XPS Characterization of Cobalt Impregnated SiO2 and g-Al2O3. Surf. Interface Anal. 2021, 53, 475-481, DOI: 10.1002/sia.6935.
133. Larrabure, G., Chero-Osorio, S., Silva-Quinones, D., Benndorf, C., Williams, M., Gao, F., Gamarra, C., Alarcon, A., Segura, C., Teplyakov, A., Rodriguez-Reyes, J. C. F. Surface Processes at a Polymetallic (Mn-Fe-Pb) Sulfide Subject to Cyanide Leaching under Sonication Conditions and with an Alkaline Pretreatment: Understanding Differences in Silver Extraction with X-ray Photoelectron Spectroscopy (XPS). Hydrometallurgy 2021, 200, 105544, DOI: 0.1016/j.hydromet.2020.105544.
132. He, C., Cai, X., Wei, S.-H., Janotti, A., and Teplyakov, A. V. Self-Catalyzed Sensitization of CuO Nanowires via Solvent-Free Click Reaction. Langmuir 2020, DOI: 10.1021/acs.langmuir.0c02262.
131. Silva-Quinones, D., He, C., Dwyer, K. J., Butera, R. E., Wang, G. T., and Teplyakov, A. V. Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si-N Bonds. Langmuir 2020, 36, 12866-12876, DOI: 10.1021/acs.langmuir.0c02088.
130. Silva-Quinones, D., He, C., Butera, R. E., Wang, G. T., and Teplyakov, A. V. Reaction of BCl3 with H- and Cl-Terminated Si(100) as a Pathway for Selective Monolayer Doping through Wet Chemistry. Appl. Surf. Sci. 2020, 533, 146907, DOI: 10.1016/j.apsusc.2020.146907.
129. Rani, S., Byron, C., and Teplyakov, A. V. Formation of Silica-Supported Platinum Nanoparticles as a Function of Preparation Conditions and Boron Impregnation. J. Chem. Phys. 2020, 152, 134701, DOI:10.1063/1.5142503.
128. Portilla, R. E., He, C., Jacome-Collazos, M., Visurraga, K., Chirif, H., Teplyakov, A. V., and Rodríguez-Reyes, J. C. F. Acidic Pretreatment of a Copper-Silver Ore and its Beneficial Effect on Cyanide Leaching. Minerals Engineering 2020, 149, 106233, DOI:10.1016/j.mineng.2020.106233.
127. Konh, M., Lien, C., Cai, X., Wei, S.-H., Janotti, A., Zaera, F, and Teplyakov, A. V. ToF-SIMS Investigation of the Initial Stages of MeCpPt(CH3)3 Adsorption and Decomposition on Nickel Oxide Surfaces: Exploring the Role and Location of the Ligands. Organometallics 2020, 39(7), 1024-1034, DOI:10.1021/acs.organomet.9b00781.
126. Byron, C., Bai, S., Celik, G., Ferrandon, M. S., Liu, C., Ni, C., Mehdad, A., Delferro, M., Lobo, R. F., and Teplyakov, A. V. Role of Boron in Enhancing the Catalytic Performance of Supported Platinum Catalysts for Non-Oxidative Dehydrogenation of n-Butane. ACS Catal. 2020, 10, 1500-1510, DOI: 10.1021/acscatal.9b04689.
125. Chen, B., Qin, X., Lien, C., Bouman, M., Konh, M., Duan, Y., Teplyakov, A. V., and Zaera, F. Thermal Chemistry of Metal Organic Compounds Adsorbed on Oxide Surfaces. Organometallics 2020, 39(7), 928-940, DOI:10.1021/acs.organomet.9b00636.
124. O’Donnell, K. M., Byron, C., Moore, G., Thomsen, L., Warschkow, O., Teplyakov, A. V., and Schofield, S. R. Dissociation of CH3−O as a Driving Force for Methoxyacetophenone Adsorption on Si(001). J. Phys. Chem. C 2019, 123, 22239−22249, DOI: 10.1021/acs.jpcc.9b04954.
123. Konh, M., Lien, C., Zaera, F, and Teplyakov, A. V. Application of Time-of-Flight Secondary Ion Mass Spectrometry to the Detection of Surface Intermediates during the First Cycle of Atomic Layer Deposition (ALD) of Platinum on Silica Surfaces. Appl. Surf. Sci. 2019, 488, 468-476, DOI: 10.1016/j.apsusc.2019.05.209
122. He, C., Janzen, R., and Teplyakov, A. V. ‘Clickable’ Metal Oxide Nanomaterials Surface-Engineered by Gas-Phase Covalent Functionalization with Prop-2-ynoic Acid. Chem. Mater. 2019, 31, 2068-2077, DOI: 10.1021/acs.chemmater.8b05124.
121. Sullivan, S. P., Leftwich, T. R., Goodwin, C. M., Ni, C., Teplyakov, A. V., and Beebe, T. P., Jr. Growth and Chemical Modification of Silicon Nanostructures Templated in Molecule Corrals: Parallels with the Surface Chemistry of Single Crystalline Silicon. Surf. Sci. 2019, 683, 38-45, DOI: 10.1016/j.susc.2019.01.010.
120. Konh, M., He, C., Lin, X., Guo, X., Pallem, V., Opila, R. L., Teplyakov, A. V., Wang, Z., and Yuan, B. Molecular Mechanisms of Atomic Layer Etching of Cobalt with Molecular Chlorine and Diketones. J. Vac. Sci. Technol. A. 2019, 37, 021004; DOI: 10.1116/1.5082187. This article was chosen it to be promoted as an Editor’s Pick.
119. Silva-Quiñones, D., He, C., Jacome-Collazos, M., Benndorf, C., Teplyakov, A. V., and Rodriguez-Reyes, J. C. F. Identification of Surface Processes in Individual Minerals of a Complex Ore through the Analysis of Polished Sections Using Polarization Microscopy and X-ray Photoelectron Spectroscopy (XPS), Minerals 2018, 8, 427; DOI: 10.3390/min8100427.
118. He, C. and Teplyakov, A. V. 29,31-HPhthalocyanine Covalently Bonded Directly to a Si(111) Surface Retains Its Metalation Ability. Langmuir2018, 34(37), 10880–10888, DOI: 10.1021/acs.langmuir.8b02259.
117. Konh, M., He, C., Li, Z., Bai, S., Galoppini, E., Gundlach, L., and Teplyakov, A. V. Comparison of ZnO Surface Modification with Gas-Phase Propiolic Acid at High and Medium Vacuum Conditions. J. Vac. Sci. Technol. A2018, 36(4), 041404-1-8, DOI: 10.1116/1.5031945.
116. Lien, C., Konh, M., Chen, B., Teplyakov, A. V., and Zaera, F. Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe3. J. Phys. Chem. Lett.2018, 9(16), 4602–4606, DOI: 10.1021/acs.jpclett.8b02125
115. Zhao, J., Konh, M., and Teplyakov, A. V. Surface Chemistry of Thermal Dry Etching of Cobalt Thin Films Using Hexafluoroacetylacetone (hfacH). Appl. Surf. Sci.2018, 455, 438-445, DOI: 10.1016/j.apsusc.2018.05.182.
114. Williams, M. G. and Teplyakov, A. V. Indirect Photopatterning of Functionalized Organic Monolayers via Copper-Catalyzed “Click Chemistry”. Appl. Surf. Sci.2018, 447, 535-541, DOI: 10.1016/j.apsusc.2018.04.007.
113. Barry, S. T., Teplyakov, A. V., and Zaera, F. The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces. Acc. Chem. Res. 2018,51, 800-809,DOI 10.1021/acs.accounts.8b00012.
112. He, C., Abraham, B., Fan, H., Harmer, R., Li, Z., Galoppini, E., Gundlach, L, and Teplyakov, A. V. Morphology-Preserving Sensitization of ZnO Nanorod Surfaces via Click-Chemistry. J. Phys. Chem. Lett. 2018, 9(4), 768-772, DOI: 10.1021/acs.jpclett.7b03388.
111. Duan, Y., Rani, S., Newberg, J. T., and Teplyakov, A. V. Investigation of the influence of oxygen plasma on supported silver nanoparticles. J. Vac. Sci. Technol. A 2018, 35(1), 01B101-1-8, DOI: 10.1116/1.4986208.
110. Zhao, J., Gao, F., Pujari, S. P., Zuilhof, H., and Teplyakov, A. V. Universal Calibration of Computationally Predicted N 1s Binding Energies for Interpretation of XPS Experimental Measurements, Langmuir2017, 33(41), 10792–10799; DOI:10.1021/acs.langmuir.7b02301.
109. Duan, Y., Rani, S., Zhang, Y., Ni, C., Newberg, J. T., and Teplyakov, A. V. Silver Deposition onto Modified Silicon Substrates. J. Phys. Chem. C2017, 121, 7240-7247, DOI: 10.1021/acs.jpcc.6b12896.
108. Duan, Y., Rani, S., Zhang, Y., Ni, C., Newberg, J. T., and Teplyakov, A. V. Silver Deposition onto Modified Silicon Substrates. J. Phys. Chem. C2017, 121, 7240-7247, DOI: 10.1021/acs.jpcc.6b12896.
107. Zhao, J., Noffke, B. W., Raghavachari, K., and Teplyakov, A. V. Temperature-Programmed Desorption (TPD) and Density Functional Theory (DFT) Study Comparing the Adsorption of Ethyl Halides on the Si(100) Surface. J. Phys. Chem. C2017, 121, 7208-7213, DOI: 10.1021/acs.jpcc.6b12184.
106. Gao, F. and Teplyakov, A. V. A Monolayer of Hydrazine Facilitates Direct Covalent Attachment of C60Fullerene to a Silicon Surface. Langmuir2017, DOI:10.1021/acs.langmuir.6b03975.
105. Duan, Y. and Teplyakov, A. V. Deposition of Copper from Cu(I) and Cu(II) Precursors onto HOPG Surface: Role of Surface Defects and Choice of a Precursor. J. Chem. Phys.2017, 146, 052814-1-8.
104. Chen, B., Duan, Y., Yao, Y., Ma, Q., Coyle, J. P., Barry, S. T., Teplyakov, A. V., and Zaera, F. Activation of the Dimers and Tetramers of Metal Amidinate ALD Precursors upon Adsorption on Silicon Oxide Surfaces. J. Vac. Sci. Technol. A2017, 35(1), 01B124.
103. Williams, M. G., Gao, F., BenDhiab, I. and Teplyakov, A. V. Carbon Nanotubes Covalently Attached to Functionalized Surfaces Directly through the Carbon Cage. Langmuir2017, 33 (5), 1121–1131. This work is featured on the cover of the issue.
102. Zhao, J., Madachik, M. R., O’Donnell, K. M., Moore, G., Thomsen, L., Warschkow, O., Schofield, S. R., and Teplyakov, A. V. Adsorption and Dissociation of a Bicyclic Tertiary Diamine, Triethylenediamine, on a Si(100)-2×1 Surface. J. Phys. Chem. C,2016, 120 (50), 28672-28681.
101. Duan, Y., Pirolli, L., and Teplyakov, A. V. Investigation of the H2S Poisoning Process for Sensing Composite Material Based on Carbon Nanotubes and Metal Oxides. Sensors and Actuators B, 2016, 235, 213-221.
100. Kung, S. and Teplyakov, A. V. Transmetalation Process as a Route for Preparation of Zinc Oxide-Supported Copper Nanoparticles. Langmuir, 2016, 32(28), 7029–7037.
99. Gao, F. and Teplyakov, A. V. Dehydrohalogenation Reaction of Phenylhydrazine with Cl-Terminated Si(111) Surfaces. J. Phys. Chem. C, 2016, 120 (10), 5539-5548.
98. Liu, Y., Williams, M. G. Miller, T., and Teplyakov, A. V. Nanoparticle Layer Deposition for Highly Controlled Multilayer Formation Based on High-Coverage Monolayers of Nanoparticles. Thin Solid Films2016, 598,16-24.
97. Williams, M. G. and Teplyakov, A. V. Building High-Coverage Monolayers of Covalently Bound Magnetic Nanoparticles. Appl. Surf. Sci.2016, 388(Part A), 461-467
96. Duan, Y.; Gao, F., and Teplyakov, A. V. Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface. J. Phys. Chem. C2015, 119, 27018-27027.
95. Zhao, J; Lin, J.-M.; Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Interpretation of Temperature-Programmed Desorption Data with Multivariate Curve Resolution: Distinguishing Sample and Background Desorption Mathematically. J. Vac. Sci. Technol. A 2015, 33(6), 061406-1-7.94.
94. Kung, H. and Teplyakov, A. V. Selectivity and Mechanism of Thermal Decomposition of b-diketones on ZnO Powder. J. Catal. 2015, 330, 145-153.
93. Kung, H. and Teplyakov, A. V. In-situ Investigation of Organic Ligand Displacement Processes on ZnO Powder Surface. J. Phys. Condens. Matter. 2015, 27, 054007 (Invited article for Special Issue entitled “Organic molecules on inorganic surfaces “).
92. Gao, F. and Teplyakov, A. V. Reaction of Hydrazine with a Cl-terminated Si(111) Surface. J. Phys. Chem. C. 2014, 118, 27998-28006.
91. Cui, Y., Tian, F., Gao, F. and Teplyakov, A. V. Building organic monolayers based on fluorinated amines on the Si(111) surface. J. Phys. Chem. C. 2014,118, 26721-26728.
90. Gao, J and Teplyakov, A. V. Chemical Transformations of Acetone on ZnO Powder. J. Catal. 2014,319, 136-141.
89. Miller, T.; Pirolli, L.; Deng, F., Ni, C. and Teplyakov, A. V. Structurally Different Interfaces between Electrospark-Deposited Titanium Carbonitride and Tungsten Carbide Films on Steel. Surf. Coat. Technol. 2014, DOI: 10.1016/j.surfcoat.2014.07.076.
88. Provisional Patent Application“Nanoparticle Layer Deposition” (Appl. 61/948,734, March 6, 2014).
87. Miller, T. and Teplyakov, A. V. Attachment Chemistry of PCBM to a Primary-Amine-Terminated Organic Monolayer on a Si(111) Surface. Langmuir, 2014, 30, 5105-5114.
86. Gao, J. and Teplyakov, A. V. Thermal Transformations of 2-Chlorophenol on a Surface of ZnO Powder Catalyst, Catal. Today2014, 238, 111-117.
85. Tian, F., Cui, Y. and Teplyakov, A. V. Nitroxidation of H-terminated Si(111) Surfaces with Nitrobenzene and Nitrosobenzene, J. Phys. Chem. C2014, 118(1), 502-512.
84. Kung, H. and Teplyakov, A. V. Formation of Copper Nanoparticles on ZnO Powder by a Surface-Limited Reaction, J. Phys. Chem. C2014, 118(4), 1990-1998.
83. Liu, Y., RamaRao, N., Miller, T., Hadjipanayis, G. and Teplyakov, A. V. Controlling physical properties of iron nanoparticles during assembly by “click chemistry”. J. Phys. Chem. C2013, 117, 19974-19983.
82. Lin, J.-M. and Teplyakov, A. V. Computational Investigation of Surface Reactivity of Functionalized Silicon Surfaces in Deposition Processes. Theor. Chem. Acc. 2013, 132, 1404-1-14.
81. Tian, F., Taber, D. F. and Teplyakov, A. V. An –NH- terminated silicon surface and a method for its preparation. US Patent: US 20130287667 A1,2013.
80. Gao, J. and Teplyakov, A. V. Surface species formed during thermal transformation of ethanol on ZnO powder. J. Catal. 2013, 300, 163-173.
79. Lin, J.-M.; Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Competing reactions during metalorganic deposition: Ligand-exchange versus direct reaction with the substrate surface. J. Vac. Sci. Technol. A2013, 31(2), 021401-1-021401-17.
78. Liu, Y.; Chen, J. and Teplyakov, A. V. Chemical passivation processes for biofunctionalization schemes on semiconductors surfaces. Langmuir2012, 28 (44), 15521-15528.
77. Liu, Y. and Teplyakov, A. V. Using a Combination of Microscopy and Spectroscopy to Confirm Covalent Bonding of DNA on Functionalized Semiconductor Surfaces, SurFACTS in Biomaterials, 2012, 17 (4), 10-11.
76. Miller, T.; Lin, J.-M.; Pirolli, L.; Coquilleau, L.; Luharuka, R. and Teplyakov, A. V. Investigation of thin titanium carbonitride coatings deposited onto stainless steel. Thin Solid Films2012, 522, 193-198.
75. Perrine, K. A.; Lin, J.-M. and Teplyakov, A. V. Controlling the formation of metallic nanoparticles on functionalized silicon surfaces. J. Phys. Chem. C2012, 116 (27), 14431–14444.
74. Tian, F., Yang, D., Opila, R. L. and Teplyakov, A. V. Chemical and electrical passivation of Si(111) surfaces. Appl. Surf. Sci.2012, 258, 3019-3026.
73. Perrine, K. A., Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Simulating the reactivity of disordered surface of the TiCN thin film. J. Phys. Chem. C2011, 115, 15432-15439.
72. Tian, F., Taber, D. F. and Teplyakov, A. V. –NH- termination on Si(111) surface by wet chemistry. J. Am. Chem. Soc.2011, 133, 20769-20777.
71. Polyakova (Stolyarova), E., Rim, K. T., Eom, D., Douglass, K., Opila, R., Heinz, T., Teplyakov, A. V. and Flynn, G. W. Scanning tunneling microscopy and X-ray photoelectron spectroscopy studies of graphene films prepared by sonication-assisted dispersion. ACS Nano2011, 5(8), 6102-6108. This work is highlighted in nanotechweb.org (http://nanotechweb.org/cws/article/tech/46735).
70. Bent, S. F.; Kachian, J. S.; Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity. PNAS2011, 108(3), 956-960.
69. Douglass, K.; Hunt, S.; Teplyakov, A. and Opila, R. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire. Appl. Surf. Sci.2010, 257, 1469-1472.
68. Rodríguez-Reyes, J. C. F., Teplyakov, A. V. and Brown, S. D.Qualitative and quantitative analysis of complex temperature-programmed desorption data by multivariate curve resolution. Surf. Sci. 2010, 604, 2043-2054.
67. Tian, F., Ni, C. and Teplyakov, A. V. Integrity of functional self-assembled monolayers on hydrogen-terminated silicon-on-insulator wafers. Appl. Surf. Sci.2010, 257(4), 1314-1318.
66. Perrine, K. A. and Teplyakov, A. V. Metallic nanostructure formation limited by the surface hydrogen on silicon. Langmuir2010, 26(15), 12648–12658.
65. Rodríguez-Reyes, J. C. F., Ni, C., Bui, H. P., Beebe, T. P., Jr., and Teplyakov, A. V. Reversible tuning of the surface chemical reactivity of titanium nitride and nitride-carbide diffusion barrier thin films. Chem. Mater.2009, 21(21), 5163-5169.
64. Madachik, M. R. and Teplyakov, A. V. Coadsorption of ethylene and nitrobenzene on Si(100)-2×1: Towards surface patterning at the molecular level. J. Phys Chem. C2009, 113, 18270-18275.
63. Zhang, X., Antonopoulos, I. H., Kumar, S., Chen, J., and Teplyakov, A. V. Tuning the Geometry of Shape-restricted DNA Molecules on the Functionalized Si(111). Appl. Surf. Sci.2009, 256, 815-818.
62. Leftwich, T. R. and Teplyakov, A. V. Calibration of computationally predicted N 1sbinding energies by comparison with X-ray photoelectron spectroscopy measurements. J. Electr. Spec. Rel. Phenom.2009, 175, 31-40.
61. Zhang, X., Kumar, S., Chen, J. and Teplyakov, A. V. Covalent attachment of DNA molecules on amine-functionalized Si(111) surface. Surf. Sci.2009, 603, 2445-2475.
60. Perrine, K. A., Leftwich, T. R., Weiland, C., Madachik, M. R., Opila, R. L. and Teplyakov, A. V. Reactions of aromatic bifunctional molecules on silicon surfaces: nitrosobenzene and nitrobenzene. J. Phys. Chem. C2009, 113(16), 6643–6653.
59. Leftwich, T. R., Madachik, M. R. and Teplyakov, A. V. Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): An ex situtool for the modification of semiconductor surfaces. J. Am. Chem. Soc. 2008, 130, 16216-16223.This work is highlighted in Chemical and Engineering News, November 24, 2008.
58. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth. J.Appl. Phys.2008, 104, 084907-1-084907-6.
57. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Role of surface strain in the subsurface migration of adsorbates on silicon. Phys Rev. B. 2008, 78, 165314-1-165314-14.
56. Madachik, M. and Teplyakov, A. V. Unique lack of chemical reactivity for 2,3-dimethyl-2-butene on a Si(100)-2×1 surface. J. Vac. Sci. Technol. B 2008, 26(5), 1241-1247.
55. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Chemisorption of tetrakis-dimethylamido-titanium on Si(100)-2×1: C-H and C-N bond reactivity leading to low-temperature decomposition pathways. J. Phys. Chem. C2008, 112, 9695-0705.
54. Perrine, K. A., Skliar, D. B., Willis, B. G. and Teplyakov, A. V. Molecular level investigation of 2,2,6,6-tetramethyl-3,5-heptanedione on Si(100)-2×1: Spectroscopic and computational studies, Surf. Sci.2008, 602, 2222-2231.
53. Leftwich, T. R. and Teplyakov, A. V. Cycloaddition reactions of phenylazide and benzylazide on a Si(100)-2×1 surface. J. Phys. Chem. C2008, 112, 4297-4303.
52. Zhang, X. and Teplyakov, A. V. Adsorption of C60Buckminster fullerenes on an 11-amino-1-undecene covered Si(111) substrate. Langmuir, 2008, 24, 810-820. This work is featured on the cover of the issue.
51. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Surface transamination reaction for tetrakis(dimethylamido)titanium with NHX-terminated Si(100) surfaces. J. Phys. Chem. C2007, 111(44), 16498-16505.
50. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Cooperative nitrogen insertion processes: Thermal transformation of NH3on a Si(100) surface. Phys. Rev. B, 2007, 76, 075348-1-075348-16.
49. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Chemistry of diffusion barrier film formation: Adsorption and dissociation of tetrakis-(dimethylamino)-titanium on Si(100)-2×1. J. Phys. Chem. C2007, 111, 4800-4808.
48. Ni, C.; Zhang, Z.; Wells, M.; Beebe, T. P., Jr.; Pirolli, L.; Méndez De Leo, L. P., and Teplyakov, A. V. Effect of film thickness and the presence of surface fluorine on the structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2×1 substrate. Thin Solid Films2007, 515, 3030-3039.
47. Pirolli, L. and Teplyakov, A. V. Adsorption and thermal chemistry of 1,1,1,5,5,5,-hexafluoro-2,4-pentanedione (hfacH) and (hexafluoroacetylacetonate)Cu (vinyltrimethylsilane) ((hfac)Cu(VTMS)) on TiCN-covered Si(100) surface. Surf. Sci. 2006, 601,155-164.
46. Méndez De Leo, L. P.; Pirolli, L. and Teplyakov, A. V. Chemistry of 1,1,1,5,5,5-hexafluoro-2,4-pentanedione on Si(100)-2×1. J. Phys. Chem. B2006, 110, 14337-14344.
45. Pirolli, L. and Teplyakov, A. V. Molecular view of copper deposition chemistry: (hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) on a Si(100)-2×1 Surface. Surf. Sci.2006, 600, 3313-3320.
44. Bocharov, S.; Dmytrenko, O.; Méndez De Leo, L. P. and Teplyakov, A. V. Azide reactions for controlling clean silicon surface chemistry: Benzylazide on Si(100)-2×1. J. Am. Chem. Soc.2006, 128, 9300-9301.
43. Méndez De Leo, L. P. and Teplyakov, A. V. Nitro group as a means of attaching organic molecules to silicon: Nitrobenzene on Si(100)-2×1. J. Phys. Chem. B2006, 110, 6899-6905.
42. Pirolli, L. and Teplyakov, A. V. Vinyltrimethylsilane (VTMS) as a probe of chemical reactivity of a TiCN diffusion barrier-covered silicon surface. J. Phys. Chem. B. 2006, 110, 4708-4716.
41. Pirolli, L. and Teplyakov, A. V. Complex thermal chemistry of vinyltrimethylsilane (VTMS) on Si(100)-2´1. J. Phys. Chem. B2005, 109(17), 8462-8468.
40. Watras, M. J. and Teplyakov, A. V. An infrared and computational investigation of vanadium-substituted Keggin [PVnW12-nO40](n+3)-polyoxometallic anions. J. Phys. Chem. B2005, 109(18), 8928-8934.
39. Bocharov, S.; Zhang, Z.; Beebe, T. P., Jr., and Teplyakov, A. V. Structure of a thin barrier film deposited from tetrakis-(dimethylamido)-titanium onto a Si(100) substrate. Thin Solid Films2005, 471, 159-165.
38. Bocharov, S. and Teplyakov, A. V. Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2×1. Surf. Sci. 2004, 573, 403-412.
37. Bulanin, K. M.; Kong, M. J.; Pirolli, L.; Mathauser, A. T. and Teplyakov, A. V. Adsorption and thermal decomposition of diethyaluminum hydride on Si(100)-2×1. Surf. Sci. 2003, 542, 167-176.
36. Wingrave, J. and Teplyakov, A. V. Infrared spectrometer attachment assembly for use with vacuum and high-pressure cells. J. Vac. Sci. Technol. A2003, 21(5), 1800-1801.
35. Bocharov, S.; Mathauser, A. T. and Teplyakov, A. V. Adsorption and thermal chemistry of nitroethane on Si(100)-2×1. J. Phys. Chem. B.2003, 107, 7776-7782.
34. Dmytrenko, O.; Huang, W.; Polenova, T. E.; Francesconi, L. C.; Wingrave, J. A. and Teplyakov, A. V. Effect of cations in infrared and computational analysis of vanadium-containing six-coordinate oxotungstates. J. Phys. Chem. B.2003, 107, 7747-7752.
33. Bocharov, S. and Teplyakov, A. V. Spectroscopic evidence for hydrogen diffusion through several-nanometers-thick titanium carbonitride layer on silicon. J. Am. Chem. Soc.2003, 125, 7196-7197.
32. Mathauser, A. T. and Teplyakov, A. V. The effects of surface poisoning by HCl on cyclization processes on a Cu3Pt(111) surface. Surf. Sci. 2003, 523, 37-47.
31. Müller, T.; Flynn, G. W.; Mathauser, A. T.; Teplyakov, A. V. Temperature-programmed desorption studies of n-alkane derivatives on graphite: Desorption energetics and the influence of functional groups on adsorbate self-assembly. Langmuir2003, 19, 2812-2821.
30. Bulanin, K. M.; Shah, A. G.; Fitzgerald, D. R.; Doren, D. J.; Teplyakov, A. V. Kinetically-favored adsorbate ordering: Hydrogen and iodine on the Si(100)-2×1 surface. J. Phys. Chem. B2002, 106, 7286-7289.
29. Bulanin, K.; Shah, A. and Teplyakov, A. V. Infrared spectroscopy studies of iodoethane on Si(100)-2×1: Adsorption and thermal decomposition leading to adsorbate ordering. J. Chem. Phys. 2001, 115(15),7187-7195.
28. Mathauser, A. T. and Teplyakov, A. V. Naphthalene formation on Cu3Pt(111): dehydrocyclization of 4-phenyl-1-butene. Catal. Lett.2001, 73(2-4), 207-210.
27. Mathauser, A. T.; He, H.; and Teplyakov, A. V. Adsorption and thermally induced reactions of halocyclohexanes on a Cu3Pt(111) surface. Surf. Sci. 2001, 479, 213-223.
26. He, H.; Mathauser, A. T.; and Teplyakov, A. V. Self-Limiting heterogeneous reactions: Bifunctional hydrocarbon on a bimetallic alloy surface. J. Phys. Chem. 2000, 104 (51), 12306-12314.
25. Kong, M. J.; Teplyakov, A. V.; Jagmohan, J.; Lyubovitsky, J. G.; Mui, C.; and Bent, S. F. Interaction of C6cyclic hydrocarbons with a Si(100)-2×1 surface: adsorption and hydrogenation reactions. J. Phys. Chem. B2000, 104, 3000-3007.
24. Gurevich, A. B.; Bent, B. E.; Teplyakov, A. V. and Chen, J. G. A NEXAFS investigation of the formation and decomposition of CuO and Cu2O thin films on Cu(100). Surf. Sci.1999, 442, L971-L976.
23. Lal, P.; Noah, Y.; Kong, M. J.; Teplyakov, A. V. and Bent, S. F. Adsorption of ethylene on the Ge(100)-2 x 1 surface: Coverage and time-dependent behavior. J. Chem. Phys.1999, 110 (21),10545-10553.
22. Teplyakov, A. V.; Lal, P.; Noah, Y. A.; Bent, S. F. Evidence for a Retro-Diels-Alder Reaction on a Single Crystal Surface: Butadienes on Ge(100). J. Am. Chem. Soc.1998, 120 (29), 7377-7378.
21. Kong, M. J.; Teplyakov, A. V. and Bent, S. F. NEXAFS studies of adsorption and reaction of benzene on Si(100)-(2×1). Surf. Sci.1998, 411, 286-293.
20. Teplyakov, A. V.; Kong, M. J. and Bent, S. F. Diels-Alder reactions of butadienes with the Si(100)-2×1 surface as a dienophile: vibrational spectroscopy, thermal desorption and near edge X-ray absorption fine structure studies. J. Chem. Phys.1998, 108 (11),4599-4606.
19. Teplyakov, A. V.; Bent, B. E.; Eng, J., Jr. and Chen, J. G. Vibrational mode-softening of alkanes on clean and modified Cu and Mo surfaces: absence of a simple correlation with thermal desorption temperatures. Surf. Sci.1998, 399, L342-L350.
18. Gurevich, A. B.; Teplyakov, A. V.; Yang, M. X. and Bent, B. E. Synthesis, bonding and reactions of p-bonded allyl groups on Cu(100): allyl radical ejection. Langmuir 1998, 14 (6),1419-1427.
17. Teplyakov, A. V.; Gurevich, A. B.; Garland, E. R. and Bent, B. E. Mechanism of dehydrocyclization of 1-hexene to benzene on Cu3Pt(111): identification of 1,3,5-hexatriene as a reaction intermediate. Langmuir1998, 14 (6),1337-1344.
16. Lusvardi, V. S.; Barteau, M. A.; Chen, J. G; Eng, J., Jr.; Frühberger, B. and Teplyakov, A. V. A NEXAFS investigation of the reduction and reoxidation of TiO2(001). Surf. Sci.1998, 397, 237-250.
15. Yang, M. X.; Teplyakov, A. V. and Bent, B. E. Regioselectivity of deuterium atom addition to olefin monolayers on Cu(100).J. Phys. Chem. B1998, 102 (16), 2985-2990.
14. Teplyakov, A. V.; Gurevich, A. B.; Yang, M. X.; Chen, J. G. and Bent, B. E. NEXAFS and TPD studies of molecular adsorption of hydrocarbons on Cu(100): segmental correlations with the heats of adsorption. Surf. Sci.1998, 396, 340-348.
13. Teplyakov, A. V.; Kong, M. J. and Bent, S. F. Vibrational spectroscopic studies of Diels-Alder reactions with the Si(100)-2×1 surface as a dienophile. J. Am. Chem. Soc.1997, 119, 11100-11101.
12. Teplyakov, A. V. Bonding and reactions of hydrocarbons and their fragments on single crystal surfaces of copper and copper-platinum alloy: identification of surface intermediates and reaction mechanisms. (1997), 274 pp. Ph. D. Thesis.
11. Teplyakov, A. V. and Bent, B. E. Mechanism of dehydrocyclization of 1-hexene to benzene on Cu3Pt(111). J. Phys. Chem. B1997, 101, 9052-9059.
10. Kash, P. W.; Yang, M. X.; Teplyakov, A. V.; Flynn, G. W. and Bent, B. E. Chemical displacement of molecules adsorbed on surfaces: low temperature studies with application to surface reactions. J. Phys. Chem. B1997, 101, 7908-7918.
9. Teplyakov, A. V. and Bent, B. E. Dehydrocyclization of 1-hexene to benzene on Cu3Pt(111). Catal. Lett.1996, 42 (1,2), 1-4.
8. Teplyakov, A. V. and Bent, B. E. Infrared spectroscopic study of the chemical displacement of hydrocarbon monolayers from a Cu(100) surface. Chem. Phys. Lett. 1996, 260, 65-70.
7. Lin, J.-L.; Teplyakov, A. V. and Bent, B. E. The effects of alkyl chain structure on carbon-halogen bond dissociation and b-hydride elimination by alkyl halides on a Cu(100) surface. J. Phys. Chem.1996, 100, 10721-10731.
6. Teplyakov, A. V. and Bent, B. E. Distinguishing direct and quasi-direct mechanisms for an Eley-Rideal gas-surface reaction: stereochemistry of H addition to cyclohexene on Cu(100). J. Chem. Soc. Faraday Trans.1995, 91 (20),3645-3654.
5. Teplyakov, A. V. and Bent, B. E. b-Hydride elimination from alkyl and cycloalkyl groups on Cu(100) surface: ring strain and planarity of the transition state. J. Am. Chem. Soc.1995, 117, 10076-10087.
4. Netrusov, A.; Teplyakov, A.; Bessarabov, D. and Teplyakov V. Gas separation systems for biotechnology by integrated membranes with moving liquid carriers. Conf. Adv. Biochem. Eng., Three-Day Symp., 2nd, 1994, 106-8.
3. Teplyakov, V.; Beckman, I.; Teplyakov, A. and Netrusov, A. Integrated membrane systems with moving liquid carriers for biogas separation in biotechnology. BHR Group Conf. Ser. Publ. 1993, 5(3rd International Conference on Bioreactor and Bioprocess Fluid Dynamics, 1993), 315-322.
2. Beckman, I. N.; Bessarabov, D. G., Teplyakov, V. V. and Teplyakov, A. V. Integrated membrane systems with moving liquid carriers for multicomponent gas separation. BHR Group Conf. Ser. Publ.1993, 3(Effective Membrane Processes-New Perspectives), 297-306.
1. Beckman, I. N.; Gladkov, V. S.; Teplyakov, V. V.; Teplyakov, A. V. and Kuznetsov, L. P. Method of membrane-absorption separation of gas mixtures and the set up for. Application for patent of the USSR, approval #1637850, BOID 53/22, 1991.