Our research program focuses on surface and interface science. Using the techniques and methods of physical chemistry, we solve problems related to chemical transformations of organic and organometallic compounds on semiconductors, thin solid film growth, nanostructure formation, surface morphology manipulation, and atomically-precise surface processes for deposition and etching (ALD and ALE). We study these processes at the molecular level with vibrational spectroscopies, high-energy electron spectroscopies, mass spectrometry, X-ray spectroscopies, microscopic techniques and supplement these experimental studies with computational investigations