Facilities

Lab Tour Videos

– Block Copolymer Thin Film Preparation & Analysis laboratory – #156
– Battery laboratory – #152
– Biomass / Polymer Synthesis laboratory – #130; #138; #143

Small Angle X-Ray Scattering (SAXS)

– 30 W (50 kV, 0.6 mA) Cu Ka, 1.54 Å
– Scaterless collimation with 2 motorized slits
– Linkam HFX350 Temperature Stage, Linkam TST250 Tensile Stage
– Continuous sample-to-detector distances: 70-2500 mm
– Domain spacing range: 0.15-150 nm
– Motorized sample stage

Ion Conductivity Measurement

– Princeton Applied Research 2273 Galvanostat/Frequency Response Analysis
– 10 µHz to 1 MHz
– <5 pF capacitance
– >1013 impedance
– 1.2 fA resolution

Block Copolymer Synthesis

– Airfree Synthesis Lines

 

 

 

 

– MBRAUN Unilab glovebox
– SG Water solvent purification columns
– 4 GPC systems:

    • Viscotek Tetra-Detector GPC
    • Tosoh EcoSEC 8320 GPC with RI, UV, and MALS LENS detectors
    • Tosoh EcoSEC HT with a viscometry detector
    • EcoSEC Elite 8420 with an RI detector

    – Refractive Index
    – Viscosity
    – Right angle light scattering and 7o low angle light scattering
    – Photodiode array (190-500 nm)

Block Copolymer Thin Film Preparation & Analysis

– Nikon Eclipse LV100 optical microscope
– diascopic (transmission) and episcopic (reflection) modes
– 5x, 10x, 20x, 50x, and 100x objectives
– 5 megapixel color camera
– polarizer and quarter wave plate
– motorized stage
– scripting available (autofocus, autocapture, stage movement)
– Fischer Scientific Isotemp vacuum ovens
– Jelight ultraviolet ozone cleaner
– Filmetrics interferometer
– Laurell WS-400-6NPP-Lite spin coater
– Thin film polymer flowcoater
– Solvent annealing flow chamber
– nitrogen carrier gas (0-50 mL/min)
– 4” diameter annealing chamber

Surface Modification

– Vapor deposition chamber
– customizable via teflon insert pieces
– typical chemistry: chlorosilanes on silicon
– typical substrate size: 3 cm wide x 6 cm long (accommodates up to 15 cm long)
– Nitrogen drying stream

Rheology

– ARES G2 rheometer
– forced convention oven (to 600°C)
– torque range: 0.05 µN.m – 200 mN.m (oscillation)
0.1 µN.m – 200 mN.m (steady shear)
– torque resolution: 1 nN.m
– minimum angular displacement: 1 µrad
– angular velocity range: 1×10-6 rad/s to 300 rad/s
– angular frequency range: 1×10-7 rad/s to 628 rad/s
– step change in velocity: 5 ms

Moai 200 3D Printer (Peopoly)

– Technology: Stereolithography (SLA)
– Printing volume: 200 mm x 200 mm x 250 mm
– Laser spot size: 70 μm
– Laser type: Solid state laser (405 nm)
– Laser power: 150 mW
– Vat system: PDMS vat or FEP vat
– Layer height: 10 – 200 µm
– Preparation software: Asura 3D